-
2
-
-
0000682955
-
-
doi: 10.1063/1.121373
-
X.-H. Du, J. Zheng, U. Belegundu, K. Unchino, Appl. Phys. Lett. 72, 2421 (1998). doi: 10.1063/1.121373
-
(1998)
Appl. Phys. Lett.
, vol.72
, pp. 2421
-
-
Du, X.-H.1
Zheng, J.2
Belegundu, U.3
Unchino, K.4
-
4
-
-
0033086497
-
-
doi: 10.1080/00150199908210582
-
S. Hiboux, P. Muralt, Ferroelectrics 224, 315 (1999). doi: 10.1080/ 00150199908210582
-
(1999)
Ferroelectrics
, vol.224
, pp. 315
-
-
Hiboux, S.1
Muralt, P.2
-
6
-
-
1842427273
-
-
doi: 10.1063/1.1645646
-
T. Oikawa, M. Aratani, H. Funakubo, K. Saito, M. Mizuhira, J. Appl. Phys. 95, 3111 (2004). doi: 10.1063/1.1645646
-
(2004)
J. Appl. Phys.
, vol.95
, pp. 3111
-
-
Oikawa, T.1
Aratani, M.2
Funakubo, H.3
Saito, K.4
Mizuhira, M.5
-
7
-
-
0032648760
-
-
doi: 10.1557/JMR.1999.0332
-
S.-H. Kim, D.-J. Kim, S.K. Streiffer, A.I. Kingon, J. Mater. Res 14, 2476 (1999). doi: 10.1557/JMR.1999.0332
-
(1999)
J. Mater. Res
, vol.14
, pp. 2476
-
-
Kim, S.-H.1
Kim, D.-J.2
Streiffer, S.K.3
Kingon, A.I.4
-
8
-
-
0001143028
-
-
doi: 10.1063/1.366614
-
P. Muralt, T. Maeder, L. Sagalowicz, S. Hiboux, S. Scalese, D. Naumovic, R.G. Agostino, N. Xanthopoulos, H.J. Mathieu, L. Patthey, E.L. Bullock, J. Appl. Phys. 83, 3835 (1998). doi: 10.1063/1.366614
-
(1998)
J. Appl. Phys.
, vol.83
, pp. 3835
-
-
Muralt, P.1
Maeder, T.2
Sagalowicz, L.3
Hiboux, S.4
Scalese, S.5
Naumovic, D.6
Agostino, R.G.7
Xanthopoulos, N.8
Mathieu, H.J.9
Patthey, L.10
Bullock, E.L.11
-
9
-
-
0027875634
-
-
in ed. by E.R. Myers, B.A. Tuttle, S.B. Desu, P.K. Larsen (Materials Research Society, Boston, MA)
-
T. Tani, Z. Xu, D.A. Payne, in Materials Research Society Symposium, ed. by E.R. Myers, B.A. Tuttle, S.B. Desu, P.K. Larsen (Materials Research Society, Boston, MA, 1993), p. 269
-
(1993)
Materials Research Society Symposium
, pp. 269
-
-
Tani, T.1
Xu, Z.2
Payne, D.A.3
-
10
-
-
0028517627
-
-
doi: 10.1557/JMR.1994.2540
-
K.G. Brooks, I.M. Reaney, R. Klissurska, Y. Huang, L. Bursill, N. Setter, J. Mater. Res. 9, 2540 (1994). doi: 10.1557/JMR.1994.2540
-
(1994)
J. Mater. Res.
, vol.9
, pp. 2540
-
-
Brooks, K.G.1
Reaney, I.M.2
Klissurska, R.3
Huang, Y.4
Bursill, L.5
Setter, N.6
-
11
-
-
0028514290
-
-
doi: 10.1111/j.1151-2916.1994.tb04602.x
-
S.-Y. Chen, I.-W. Chen, J. Am. Ceram. Soc. 77, 2332 (1994). doi: 10.1111/ j.1151-2916.1994.tb04602.x
-
(1994)
J. Am. Ceram. Soc.
, vol.77
, pp. 2332
-
-
Chen, S.-Y.1
Chen, I.-W.2
-
12
-
-
0031334272
-
-
doi: 10.1080/10584589708015698
-
D.J. Wouters, G. Willems, E.-U. Lee, H.E. Maes, Integr. Ferroelectr. 15, 79 (1997). doi: 10.1080/10584589708015698
-
(1997)
Integr. Ferroelectr.
, vol.15
, pp. 79
-
-
Wouters, D.J.1
Willems, G.2
Lee, E.-U.3
Maes, H.E.4
-
13
-
-
59749092177
-
-
in ed. by R.W. Schwartz, P.C. McIntyre, Y. Miyasaka, S.R. Summerfelt, D. Wouters (Materials Research Society, Boston, MA)
-
G.R. Fox, in Materials Research Society Symposium, ed. by R.W. Schwartz, P.C. McIntyre, Y. Miyasaka, S.R. Summerfelt, D. Wouters (Materials Research Society, Boston, MA, 2000), p. 205
-
(2000)
Materials Research Society Symposium
, pp. 205
-
-
Fox, G.R.1
-
14
-
-
0037009736
-
-
doi: 10.1016/S0040-6090(02) 00726-5
-
S.-H. Kim, D.-Y. Park, H.-J. Woo, D.-S. Lee, J. Ha, C.S. Hwang, I.-B. Shim, A.I. Kingon, Thin Solid Films 416, 264 (2002). doi: 10.1016/ S0040-6090(02) 00726-5
-
(2002)
Thin Solid Films
, vol.416
, pp. 264
-
-
Kim, S.-H.1
Park, D.-Y.2
Woo, H.-J.3
Lee, D.-S.4
Ha, J.5
Hwang, C.S.6
Shim, I.-B.7
Kingon, A.I.8
-
17
-
-
0031209207
-
-
doi: 10.1063/1.365981
-
D. Damjanovic, J. Appl. Phys. 82, 1788 (1997). doi: 10.1063/1.365981
-
(1997)
J. Appl. Phys.
, vol.82
, pp. 1788
-
-
Damjanovic, D.1
-
18
-
-
0001253798
-
-
doi: 10.1063/1.339636
-
O. Boser, J. Appl. Phys. 62, 1344 (1987). doi: 10.1063/1.339636
-
(1987)
J. Appl. Phys.
, vol.62
, pp. 1344
-
-
Boser, O.1
-
19
-
-
0001608433
-
-
doi: 10.1063/1.1331353
-
D. Bolten, U. Boettger, T. Schneller, M. Grossmann, O. Lohse, R. Waser, Appl. Phys. Lett. 77, 3830 (2000). doi: 10.1063/1.1331353
-
(2000)
Appl. Phys. Lett.
, vol.77
, pp. 3830
-
-
Bolten, D.1
Boettger, U.2
Schneller, T.3
Grossmann, M.4
Lohse, O.5
Waser, R.6
-
20
-
-
21544473339
-
-
doi: 10.1063/1.355874
-
Q.M. Zhang, H. Wang, N. Kim, L.E. Cross, J. Appl. Phys. 75, 454 (1994). doi: 10.1063/1.355874
-
(1994)
J. Appl. Phys.
, vol.75
, pp. 454
-
-
Zhang, Q.M.1
Wang, H.2
Kim, N.3
Cross, L.E.4
-
21
-
-
0033741977
-
-
doi: 10.1080/00150190008008789
-
A. Kholkin, Ferroelectrics 238, 799 (2000). doi: 10.1080/ 00150190008008789
-
(2000)
Ferroelectrics
, vol.238
, pp. 799
-
-
Kholkin, A.1
-
22
-
-
0038324203
-
-
doi: 10.1063/1.1566478
-
D.-J. Kim, J.-P. Maria, A.I. Kingon, S.K. Streiffer, J. Appl. Phys. 93, 5568 (2003). doi: 10.1063/1.1566478
-
(2003)
J. Appl. Phys.
, vol.93
, pp. 5568
-
-
Kim, D.-J.1
Maria, J.-P.2
Kingon, A.I.3
Streiffer, S.K.4
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