Investigation of the influence of the aberration induced by a plane interface on STED microscopy

Optics Express

Volumn 17, Issue 3, 2009, Pages 1714-1725

  Deng, Suhui ^a,b   Liu, Li ^a   Cheng, Ya ^a   Li, Ruxin ^a   Xu, Zhizhan ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

[No Author keywords available]

Indexed keywords

GAUSSIAN BEAMS; REFRACTIVE INDEX;

A-PLANE; ABERRATION-FREE; FLUORESCENCE EMISSION; INTENSITY PATTERNS; LAGUERRE-GAUSSIAN BEAM; PHASE MASKS; STED MICROSCOPIES; STIMULATED EMISSION DEPLETION MICROSCOPY;

STIMULATED EMISSION;

EID: 59749091312     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.001714     Document Type: Article

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