High-through out optical direct write lit lithography

Solid State Technology

Volumn 40, Issue 6, 1997, Pages 175-182

  Paufler, J ^a,b   Kuck H ^a,c,d   Seltmann, R ^a,e   Doleschal, W ^a,e   Gehner, A ^a,c   Zimmer, G ^a,f,g,h  

^a FRAUNHOFER INSTITUTE FOR MICROELECTRONIC CIRCUITS AND SYSTEMS   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^c UNIVERSITY OF BONN   (Germany)

^d University of Bonn ^*  (Germany)

^e DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^f DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^g TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^h UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5944233315     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (5)

1. E. Franks, A. Shikata, C. Baker, "Performance Testing and Results of the First Etec CORE-2564," Proc. SPIE, Vol. 1809, 12th Annual BACUS Symposium, 1992.
2. H. Kück, et al., "New System for Fast Submicron Laser Direct Writing," Proc. SPIE, Vol. 2440, Optical/Laser Microlithography VIII, 1995.
3. R. Seltmann, et al., "New System for Fast Submicron Optical Direct Writing," Microelectronic Engineering 30, 1996.
4. R. Melcher, W. Budde, H.L. Fiedler, D. Stuch, G. Zimmer, "Active-Matnx-Addressed Deformable-Elastomer-Layer Light-Valve Projection: Active Matrix and Electronics," SID 92 Digest, pp.447-454.
5. J. Kleinschmidt, R. Pätzel, P. Heist, U. Stamm, D. Basting, "Extremely Narrow Bandwidth, High Repetition Rate Laser for High NA Step and Scan Tool," Proc. SPIE, Vol. 2726, Optical/Laser Microlithography IX, 1996.