Optimal optical conditions and positioning scheme for an ultrahigh-resolution silicon drift detector-based gamma camera

Journal of Nuclear Science and Technology

Volumn 45, Issue 12, 2008, Pages 1347-1352

  Joung, Jinhun ^a   Lee, Kisung ^b   Henseler, Debora ^a   Metzger, Wilhelm ^c   Choi, Yong ^d   Ahn, Young Bok ^e   Kim, Yongkwon ^b  

^a SIEMENS CORPORATE RESEARCH   (United States)

^b Korea University   (South Korea)

^c SIEMENS AG   (Germany)

^d Sungkyunkwan University   (South Korea)

^e Konkuk University   (South Korea)

Author keywords

Gamma camera; High resolution; Positioning scheme; Silicon drift detector; Solid state detector

Indexed keywords

ACOUSTIC INTENSITY; CAMERAS; DETECTORS; GAMMA RAYS; IONIZING RADIATION; LIGHT EMISSION; LUMINESCENCE; METAL DETECTORS; PHOTOMULTIPLIERS; SCINTILLATION; SCINTILLATION COUNTERS; SIGNAL TO NOISE RATIO; SILICON DETECTORS; X RAY CAMERAS;

GAMMA CAMERA; HIGH RESOLUTION; POSITIONING SCHEME; SILICON DRIFT DETECTOR; SOLID-STATE DETECTOR;

SENSORS;

EID: 59349117107     PISSN: 00223131     EISSN: None     Source Type: Journal    
DOI: 10.3327/jnst.45.1347     Document Type: Article

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