Enhancement of etch rate for preparation of nano-sized ion-track membranes of poly(vinylidene fluoride): Effect of pretreatment and high-LET beam irradiation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 267, Issue 3, 2009, Pages 554-557

  Rohani, Rosiah ^a,b   Yamaki, Tetsuya ^a   Koshikawa, Hiroshi ^a   Takahashi, Shuichi ^a   Hasegawa, Shin ^a   Asano, Masaharu ^a   Maekawa, Yasunari ^a   Voss, Kay Obbe ^c   Trautmann, Christina ^c   Neumann, Reinhard ^c  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b UNIVERSITI KEBANGSAAN MALAYSIA   (Malaysia)

^c GSI HELMHOLTZZENTRUM FÜR SCHWERIONENFORSCHUNG GMBH   (Germany)

Author keywords

Ion beam; Ion track membrane; LET; Poly(vinylidene fluoride) (PVDF); Pretreatment

Indexed keywords

DISSOLUTION; ETCHING; ION BEAMS; IONS; IRRADIATION; LIGHTING FIXTURES;

ION BEAM; ION-TRACK MEMBRANE; LET; POLY(VINYLIDENE FLUORIDE) (PVDF); PRETREATMENT;

FILM PREPARATION;

EID: 59349105668     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.12.005     Document Type: Article

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