Crystalline structure of highly piezoelectric (K,Na)NbO3 films deposited by RF magnetron sputtering

Japanese Journal of Applied Physics

Volumn 47, Issue 12, 2008, Pages 8909-8913

  Shibata, Kenji ^a   Oka, Fumihito ^a   Nomoto, Akira ^a   Mishima, Tomoyoshi ^a   Kanno, Isaku ^b  

^a HITACHI CABLE LTD   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

(K,Na)NbO3 films; Crystalline structures; Lattice parameters; Piezoelectric properties; RF magnetron sputtering; XRD measurements

Indexed keywords

CRYSTALLINE MATERIALS; LATTICE CONSTANTS; MAGNETRON SPUTTERING; MAGNETRONS; OXIDE MINERALS; PEROVSKITE; PIEZOELECTRICITY; PLATINUM; SILICON; SODIUM; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS;

(K,NA)NBO3 FILMS; CRYSTALLINE STRUCTURES; LATTICE PARAMETERS; PIEZOELECTRIC PROPERTIES; RF MAGNETRON SPUTTERING; XRD MEASUREMENTS;

STRUCTURAL PROPERTIES;

EID: 59349102179     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.8909     Document Type: Article

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