Piezoelectric properties of (K, Na)NbO3 films deposited by RF magnetron sputtering

Applied Physics Express

Volumn 1, Issue 1, 2008, Pages

  Shibata, Kenji ^a   Oka, Fumihito ^a   Ohishi, Akio ^a   Mishima, Tomoyoshi ^a   Kanno, Isaku ^b  

^a HITACHI CABLE LTD   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHY; MAGNETRON SPUTTERING; MAGNETRONS; OXIDE MINERALS; PEROVSKITE; SILICON; SODIUM;

CUBIC PEROVSKITES; EPITAXIALLY GROWN; LEAD-FREE; PIEZOELECTRIC COEFFICIENTS; PIEZOELECTRIC PROPERTIES; POLYCRYSTAL LINES; RF MAGNETRON SPUTTERING; SI SUBSTRATES; TIP DISPLACEMENTS; UNIMORPH;

PIEZOELECTRICITY;

EID: 57049182515     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.1.011501     Document Type: Article

References (12)

1. M. Demartin Maeder, D. Damjanovic, and N. Setter: J. Electroceram. 13 (2004) 385.
2. Y. Saito, H. Takao, T. Tani, T. Nonoyama, K. Takatori, T. Homma, T. Nagaya, and M. Nakamura: Nature (London) 432 (2004) 84.
3. F. Soderlind, P.-O. Kail, and U. Helersson: J. Cryst. Growth 281 (2005) 468.
4. A. Onoe, A. Yoshida, and K. Chikuma: Appl. Phys. Lett. 69 (1996) 167.
5. X. Wang, U. Helmersson, and S. Olafsson: Appl. Phys. Lett. 73 (1998) 927.
6. S.-W. Oh, J. Akedo, J.-H. Park, and Y. Kawakami: Jpn. J. Appl. Phys. 45 (2006) 7465.
7. T. Saito, T. Wada, H. Adachi, and I. Kanno: Jpn. J. Appl. Phys. 43 (2004) 6627.
8. I. Kanno, H. Kotera, and K. Wasa: Sens. Actuators A 107 (2003) 68.
9. T. Mino, S. Kuwajima, T. Suzuki, I. Kanno, H. Kotera, and K. Wasa: Jpn. J. Appl. Phys. 46 (2007) 6960.
10. G. H. Haertling: J. Am. Ceram. Soc. 50 (1967) 329.
11. M.-A. Dubois and P. Muralt: Sens. Actuators A 77 (1999) 106.
12. S. Zhang, R. Xia. T.-R. Shrout, G. Zang, and J. Wang: J. Appl. Phys. 100 (2006) 104108.