Low-temperature sintering of ZrW2O8-SiO2 by spark plasma sintering

Journal of Materials Science

Volumn 44, Issue 3, 2009, Pages 855-860

  Kanamori, Kenji ^a   Kineri, Tohru ^a   Fukuda, Ryohei ^b   Kawano, Takafumi ^c   Nishio, Keishi ^d  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b Sumitomo Metal (SMI) Electronics Devices Inc   (Japan)

^c UBE INDUSTRIES LTD   (Japan)

^d TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COLLOIDS; CRACKING (CHEMICAL); DIELECTRIC PROPERTIES; ELECTRIC SPARKS; GELATION; GELS; NANOSTRUCTURED MATERIALS; PLASMAS; POWDERS; QUENCHING; SILICON COMPOUNDS; SINTERING; SOL-GELS; SOLS; SPARK PLASMA SINTERING; THERMAL EXPANSION; THERMAL SPRAYING;

COMBINED TECHNIQUES; HIGH DENSITIES; HOLDING TIME; LOW-TEMPERATURE SINTERING; MELT-QUENCHING; MELT-QUENCHING METHODS; RELATIVE DENSITIES; SPARK PLASMAS; THERMAL CRACKINGS; THERMAL-EXPANSION PROPERTIES;

SOL-GEL PROCESS;

EID: 58849148470     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-008-3128-6     Document Type: Article

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