A novel moisture-resistant film for NiSO4·6H2O filter based on isophorone diisocyanate-bridged polysilsesquioxane

Materials Chemistry and Physics

Volumn 114, Issue 2-3, 2009, Pages 868-873

  Hu, Shengwei ^a,b   Yang, Dongjiang ^c   Xu, Yao ^a   Wu, Dong ^a   Sun, Yuhan ^a  

^a INSTITUTE OF COAL CHEMISTRY   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c QUEENSLAND UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

Film; Moisture resistant; Polysilsesquioxane; UV light filter

Indexed keywords

COLLOIDS; GELATION; LIGHT; MOISTURE; OPTICAL FILTERS; POLYCONDENSATION; SILANES; SILICON COMPOUNDS; SOLS; THERMODYNAMIC STABILITY;

3-AMINOPROPYLTRIETHOXYSILANE; AT WAVELENGTHS; BASIC CATALYSIS; CONDENSATION DEGREES; CRYSTAL WAFERS; DIP COATINGS; FILM; FILTER-BASED; ISOPHORONE DIISOCYANATE; MOISTURE-RESISTANT; NICKEL SULFATES; OPTICAL TRANSMITTANCES; POLYSILSESQUIOXANE; PORE VOLUMES; SILSESQUIOXANE; SOL - GELS; THERMAL STABILITIES; TRANSPARENT FILMS; UV LIGHT FILTER;

FILM PREPARATION;

EID: 58849130111     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.10.071     Document Type: Article

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