Fabrication and performance of diffractive optics for quantum well infrared photodetectors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3379, Issue , 1998, Pages 402-409

  Pool, Frederick S ^a   Wilson, Daniel W ^a   Maker, Paul D ^a   Muller, Richard E ^a   Gill, John J ^a   Sengupta, Deepak K ^a   Liu, John K ^a   Bandara, Sumith V ^a   Gunapala, Sarath D ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Diffractive optics; GaAs; Multi quantum well; PMMA

Indexed keywords

ACETONE; CYCLOTRONS; DETECTORS; ELECTRON CYCLOTRON RESONANCE; ETCHING; FABRICATION; FOCUSING; GALLIUM ALLOYS; INFRARED DETECTORS; LENSES; LIGHT; MICROWAVES; OPTICAL INSTRUMENTS; OPTOELECTRONIC DEVICES; PHOTODETECTORS; PHOTORESISTS; PLASMA ETCHING; QUANTUM WELL LASERS; SEMICONDUCTING GALLIUM; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR QUANTUM WELLS; SEMICONDUCTOR QUANTUM WIRES;

BINARY MASKS; DIFFRACTIVE OPTICS; ELECTRON CYCLOTRONS; GAAS; INCIDENT LIGHT; MICROWAVE PLASMA (MP); MULTI-QUANTUM-WELL; PATTERN TRANSFERRING; PMMA; QUANTUM WELLS; SURFACE RELIEFS;

DRY ETCHING;

EID: 58749106453     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.317608     Document Type: Conference Paper

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