Fabrication and performance of optical-interconnect analog-phase holograms made by electron-beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 10284, Issue , 1996, Pages 415-430

  Maker, Paul D ^a   Wilson, Daniel W ^a   Muller, Richard E ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Analog phase holograms; Binary optics; Diffractive optics; E beam written phase holograms; Optical interconnects; Phase holograms

Indexed keywords

DIFFRACTIVE OPTICS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ERRORS; ESTERS; FABRICATION; LITHOGRAPHY; OPTICAL INTERCONNECTS; DEGRADATION; ERROR ANALYSIS; FOURIER OPTICS; HOLOGRAPHY; NUMERICAL ANALYSIS; POLYMETHYL METHACRYLATES; SIMULATION;

BINARY OPTICS; DIRECT WRITE ELECTRON-BEAM LITHOGRAPHY; FABRICATION ERRORS; FREE SPACE OPTICAL INTERCONNECTS; NUMERICAL SOLUTION; OPTICAL INTERCONNECT; OPTICAL PERFORMANCE; PHASE HOLOGRAMS; ANALOG-PHASE HOLOGRAMS; HELMHOLTZ EQUATION;

HOLOGRAMS; OPTICAL INTERCONNECTS;

EID: 0029733941     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.229275     Document Type: Conference Paper

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