Status of the optical metrology at the ESRF

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2856, Issue , 1996, Pages 314-322

  Hignette, Olivier ^a   Rommeveaux, Amparo ^a  

^a EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

Active optics; Optical metrology; Wavefront analyzer; X ray mirrors

Indexed keywords

LUMINANCE; MIRRORS; SYNCHROTRON RADIATION; SYNCHROTRONS; WAVEFRONTS;

ACTIVE OPTICS; ACTIVE OPTICS CONTROL; BEAMLINE MIRRORS; ITS ARCHITECTURE; OPTICAL COMPONENTS; OPTICAL METROLOGY; SOFTWARE AND HARDWARES; X RAY MIRRORS;

OPTICAL SYSTEMS;

EID: 58749083734     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.259863     Document Type: Conference Paper

References (9)

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3. I. Schelokov., O. Hignette, C. Raven, A. Snigierev, "X-ray interferometry technique for mirror and multilayer characterization. ", SPIE 2805, DENVER 1996, Multilayer and grazing incidence X-Ray optics III (to be published)
4. L. Church, P. Takaks., " Specifications of glancing and normal incidence X-ray mirrors ", Optical engineering, 34, 1995, p. 353.
5. P. Takaks, "design of a LTP; metrology figure and finish", SPIE Vol. 749, 1987, p. 59.
6. Zeiss detect 16 wavefront sensor, ZEISS 73446 OBERKOCHEN.
7. J. Susini, D. Labergerie, O. Hignette. " R&D program on the bimorph mirrors at the ESRF", SPIE 2856, DENVER 1996, Optics for high brightness synchrotron radiatiion beamlines II (to be published)
8. E. Ziegler, O. Hignette, M. Lingham, "X-ray focusing using elliptically bent multilayers", SPIE 2856, DENVER 1996, Optics for high brightness synchrotron radiatiion beamlines II (to be published)
9. J. P. Gaffard, P. Jagourel, "An active bimorph structure for X-ray gratings and mirrors", SPIE 2856, DENVER 1996, Optics for high brightness synchrotron radiatiion beamlines II (to be published)