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Volumn 294-95, Issue , 1997, Pages 181-184
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High-resolution electron beam lithography with Langmuir-Blodgett films
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
COPOLYMERS;
LANGMUIR BLODGETT FILMS;
POLYMETHYL METHACRYLATES;
SILICON;
SUBSTRATES;
SYNTHESIS (CHEMICAL);
ELECTRON BEAM RESISTS;
SPIN CASTING;
ELECTRON BEAM LITHOGRAPHY;
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EID: 5844334719
PISSN: 1058725X
EISSN: None
Source Type: Journal
DOI: 10.1080/10587259708042825 Document Type: Article |
Times cited : (3)
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References (14)
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