Interface and electronic characterization of thin epitaxial Co3 O4 films

Surface Science

Volumn 603, Issue 2, 2009, Pages 291-297

  Vaz, C A F ^a   Wang, H Q ^a   Ahn, C H ^a   Henrich, V E ^a   Baykara, M Z ^a,b   Schwendemann, T C ^a,b   Pilet, N ^a,b   Albers, B J ^a,b   Schwarz, U D ^a,b   Zhang, L H ^a,c   Zhu, Y ^a,c   Wang, J ^a,b   Altman, E I ^a,b  

^a YALE UNIVERSITY   (United States)

^b Yale University   (United States)

^c BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

Co3O4; Interface structure; Polar surfaces; Spinel; Surface termination

Indexed keywords

ATOMIC PHYSICS; ATOMS; COBALT COMPOUNDS; CRYSTAL ATOMIC STRUCTURE; CRYSTAL GROWTH; CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; ELECTRONIC STRUCTURE; EPITAXIAL FILMS; EPITAXIAL GROWTH; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR BEAMS; MOLECULAR DYNAMICS; MOLECULAR OXYGEN; OXYGEN; SINGLE CRYSTALS; SOIL CONSERVATION; STOICHIOMETRY;

CO3O4; INTERFACE STRUCTURE; POLAR SURFACES; SPINEL; SURFACE TERMINATION;

COBALT;

EID: 58249096354     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.11.022     Document Type: Article

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