Impurity contamination and diffusion during annealing in implanted ZnO

Key Engineering Materials

Volumn 388, Issue , 2009, Pages 23-26

  Sakaguchi, Isao ^a   Adachi, Yutaka ^a   Ogaki, Takeshi ^a   Matsumoto, Kenji ^a   Hishita, Syunichi ^a   Haneda, Hajime ^a   Ohashi, Naoki ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Contamination; Diffusion; Ion implantation; Lithium; Secondary ion mass spectrometry; Zinc oxide

Indexed keywords

ANNEALING; CONTAMINATION; DIFFUSION; ION IMPLANTATION; IONS; LITHIUM; SECONDARY ION MASS SPECTROMETRY; TEMPERATURE; ZINC OXIDE;

IMPURITY CONTAMINATION; IMPURITY DIFFUSION; LI DIFFUSION; LOW TEMPERATURE ANNEALING; ZNO CERAMIC;

II-VI SEMICONDUCTORS;

EID: 58149525170     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: None     Document Type: Article

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