Structural studies of copper sulfide films: Effect of ambient atmosphere

Science and Technology of Advanced Materials

Volumn 9, Issue 3, 2008, Pages

  Kundu, Manisha ^a,b   Hasegawa, Tsuyoshi ^a,b   Terabe, Kazuya ^a,b   Yamamoto, Kazuhiro ^c   Aono, Masakazu ^a,b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Copper sulfide; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

DIFFRACTION; ELECTRON SPECTROSCOPY; OXIDE FILMS; OXYGEN; PHASE STRUCTURE; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; SPECTRUM ANALYSIS; STABILITY; STOICHIOMETRY; SULFUR; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMBIENT ATMOSPHERES; COPPER SULFIDE; COVELLITE; CU FILMS; DIVALENT STATES; FILM SURFACES; OVERLAYERS; OXYGEN UPTAKES; STRUCTURAL STABILITIES; STRUCTURAL STUDIES; SULFATE SPECIES; SULFUR CONTENTS; SURFACE REGIONS;

COPPER;

EID: 58149393353     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1088/1468-6996/9/3/035011     Document Type: Article

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