Optimization of growth conditions of ZnO nano thin films by chemical double dip technique

Science and Technology of Advanced Materials

Volumn 9, Issue 3, 2008, Pages

  Vijayan, Thirukonda Anandamoorthy ^a   Chandramohan, Rathinam ^a   Valanarasu, Santiyagu ^b   Thirumalai, Jagannathan ^a   Venkateswaran, Sivasuriyan ^a   Mahalingam, Thaiyan ^c   Srikumar, Subbiah Ramachandran ^d  

^a Sree Sevugan Annamalai College   (India)

^b Ananda College   (India)

^c ALAGAPPA UNIVERSITY   (India)

^d KALASALINGAM UNIVERSITY   (India)

Author keywords

AFM; Chemical deposition; SEM; XPS; ZnO

Indexed keywords

ATOMIC FORCE MICROSCOPY; METALLIC FILMS; MICROSCOPES; OXIDE FILMS; OXYGEN; PHOTOELECTRON SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING ZINC COMPOUNDS; SOLIDS; SURFACE MORPHOLOGY; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE;

AFM; CHEMICAL DEPOSITION; SEM; XPS; ZNO;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 58149384623     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1088/1468-6996/9/3/035007     Document Type: Article

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