Controllable feature sizes of highly conductive poly(3,4- ethylenedioxythiophene) nanofilms patterned on SiO 2 surface

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 10, 2008, Pages 5080-5084

  Kim, Sungsoo ^a   Kwon, Taewook ^a   Sohn, Honglae ^b   Kim, Jin Yeol ^a   Shin, Hyunjung ^a   Kim, Chul ^a   Lee, Jaegab ^a  

^a Kookmin University   (South Korea)

^b Chosun University   (South Korea)

Author keywords

Feature size; Patterning; Poly(3,4 ethylenedioxythiophene); Vapor phase polymerization

Indexed keywords

ADHESION IMPROVEMENTS; ATOMIC FORCE MICROSCOPES; ELECTRICAL CONDUCTIVITIES; ELECTRODE COMPONENTS; ELECTRODE MATERIALS; FEATURE SIZE; NANO FILMS; OPTICAL-; OTFT DEVICES; OTS MONOLAYERS; PATTERNED FILMS; PATTERNING; PATTERNING METHODS; PEDOT NANOFILMS; PEEL TESTS; POLY(3,4-ETHYLENEDIOXYTHIOPHENE); REACTIVE ATOMIC OXYGENS; SCRUTINIZATION; SILICON WAFER SUBSTRATES; V CURVES; VAPOR PHASE POLYMERIZATION;

ADHESION; ATOMIC PHYSICS; BOND STRENGTH (CHEMICAL); CHEMICAL BONDS; CHEMICAL REACTIONS; ELECTRIC CONDUCTIVITY; ELECTRON ENERGY LEVELS; MONOMERS; OPTICAL CONDUCTIVITY; OXYGEN; POLYMERIZATION; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON COMPOUNDS; SILICON WAFERS; THICK FILMS; VAPOR PHASE EPITAXY; VAPORS;

CONDUCTING POLYMERS;

EID: 58149250573     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2008.1297     Document Type: Conference Paper

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