Thickness correction for the measurement of the resistivity for micro-areas by using the improved rymaszewski method with the square four-point probe

Nami Jishu yu Jingmi Gongcheng/Nanotechnology and Precision Engineering

Volumn 6, Issue 6, 2008, Pages 454-457

  Sun, Yi Cai ^a   Wang, Wei ^a   Qu, Huai Bo ^a  

^a HEBEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Improved Rymaszewski method; Measurement of the resistivity; Testing for micro areas; Theory of mirror image; Thickness correction

Indexed keywords

AS MIRRORS; CORRECTION METHODS; CURRENT SOURCES; IMPROVED RYMASZEWSKI METHOD; INFINITE SERIES; POINT PROBE MEASUREMENTS; PROBE TECHNIQUES; TEST POINTS; THEORY OF MIRROR IMAGE; THICKNESS CORRECTION;

MEASUREMENTS; MIRRORS;

OPTICAL TESTING;

EID: 58149242789     PISSN: 16726030     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

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