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Volumn 40, Issue 13, 2008, Pages 1650-1654
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Surface and interface structural analysis of VOx/TiO2 (110) by X-ray photoelectron diffraction
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Author keywords
Low energy electron diffraction; Titanium oxide; Vanadium oxide; X ray photoelectron diffraction; X ray photoelectron spectroscopy
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Indexed keywords
ANNEALING;
ATOMIC PHYSICS;
CELL CULTURE;
CLARIFICATION;
CRYSTAL ATOMIC STRUCTURE;
DIFFRACTION;
ELECTRODEPOSITION;
ELECTRON DIFFRACTION;
ELECTRON ENERGY LOSS SPECTROSCOPY;
ELECTRON SPECTROSCOPY;
ELECTRONS;
LOW ENERGY ELECTRON DIFFRACTION;
OXIDES;
OXYGEN;
PHOTOELECTRICITY;
PHOTOELECTRON SPECTROSCOPY;
PHOTOELECTRONS;
PHOTOIONIZATION;
PHOTONS;
SPECTRUM ANALYSIS;
STRUCTURAL ANALYSIS;
SURFACE STRUCTURE;
SURFACES;
TITANIUM;
TITANIUM OXIDES;
TRANSITION METALS;
ULTRATHIN FILMS;
VANADIUM ALLOYS;
VANADIUM COMPOUNDS;
X RAYS;
(1 1 0) SURFACE;
CLUSTER MODELLING;
CRYSTAL SURFACES;
ENERGY ELECTRON DIFFRACTION;
IN PROCESS;
INTERFACE STRUCTURES;
OXYGEN ATMOSPHERES;
R FACTOR;
RELIABILITY FACTORS;
SURFACE AND INTERFACES;
TITANIUM OXIDE;
VANADIUM OXIDE;
X-RAY PHOTOELECTRON DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 58049121033
PISSN: 01422421
EISSN: 10969918
Source Type: Journal
DOI: 10.1002/sia.2885 Document Type: Article |
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Times cited : (6)
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References (12)
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