Laser-damage processes in cleaved and polished CaF2 at 248nm

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2714, Issue , 1996, Pages 260-272

  Reichling, Michael ^a   Gogoll, S ^a   Stenzel, E ^a   Johansen, H ^b   Huisinga, M ^a   Matthias, Eckart ^a  

^a FREIE UNIVERSITÄT BERLIN   (Germany)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

Author keywords

Ablation; Cracking; Damage thresholds; Mirage technique; SEM; Single crystal CaF2; Surface modification; UV laser damage

Indexed keywords

ABLATION; CHEMICAL MODIFICATION; CRYSTALLINE MATERIALS; LASER DAMAGE; LASERS; OPTICAL MATERIALS; SCANNING ELECTRON MICROSCOPY; SINGLE CRYSTAL SURFACES; SINGLE CRYSTALS; SURFACE PHENOMENA; SURFACE TREATMENT; VISUAL COMMUNICATION;

CRACKING; DAMAGE THRESHOLDS; MIRAGE TECHNIQUE; SEM; SURFACE MODIFICATION; UV LASER-DAMAGE;

SURFACES;

EID: 57849108583     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240356     Document Type: Conference Paper

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