Photoelectrochemical study of influence factors on corrosion resistance of cupronickel B30 in simulated water

Acta Chimica Sinica

Volumn 65, Issue 18, 2007, Pages 1981-1986

  Xu, Qun Jie ^a   Wan, Zong Yue ^a,b   Yin, Ren He ^b   Zhu, Lü Jun ^a,b   Cao, Wei Min ^b   Zhou, Guo Ding ^a   Lin, Chang Jian ^c  

^a SHANGHAI UNIVERSITY OF ELECTRIC POWER   (China)

^b SHANGHAI UNIVERSITY   (China)

^c XIAMEN UNIVERSITY   (China)

Author keywords

Corrosion; Cupronickel alloy; Photoelectrochemistry; Simulated water

Indexed keywords

EID: 57749097746     PISSN: 05677351     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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