Synthesis and structure of a hafnium silylamide complex and the chemical vapor deposition of HfxSi1-xO2 films

Inorganica Chimica Acta

Volumn 362, Issue 2, 2009, Pages 385-388

  Jiménez, Edixa de L ^a   Javed, Saba ^a   Hoffman, David M ^a  

^a University of Houston   (United States)

Author keywords

Hafnium complex; MOCVD; Silicon 29 NMR; Silylamide complex; X ray crystal structure

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SILICATES; THIN FILMS;

AS-DEPOSITED FILMS; HAFNIUM COMPLEXES; HAFNIUM SILICATES; LOW PRESSURE CVD; SILYLAMIDE COMPLEX; SUBSTRATE TEMPERATURE; X RAY CRYSTAL STRUCTURES;

HAFNIUM COMPOUNDS;

EID: 57749096331     PISSN: 00201693     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ica.2008.04.020     Document Type: Article

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