New metal-organic precursor for the low-temperature atmospheric pressure chemical vapor deposition of zinc oxide films

Journal of Materials Science Letters

Volumn 18, Issue 10, 1999, Pages 789-791

  Suh, S ^a   Hoffman, D M ^a   Atagi, L M ^b   Smith, D C ^b  

^a University of Houston   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; FILM PREPARATION; FILMS; LOW TEMPERATURE PROPERTIES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION ANALYSIS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; ETHYL ZINC DIETHYLAMIDE; METALORGANIC PRECURSORS;

ZINC OXIDE;

EID: 0032685986     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006689017053     Document Type: Article

References (25)

1. F. T. J. SMITH, Appl. Phys. Lett. 43 (1983) 1108.
2. A. P. ROTH and D. F. WILLIAMS, J. Appl. Phys. 52 (1981) 6685.
3. K. TABUCHI, W. W. WENAS, A. YAMADA, M. KONAGAI and K. TAKAHASHI, Jpn. J. Appl. Phys. 32 (1993) 3764.
4. J. HU and R. G. GORDON, J. Appl. Phys. 72 (1992) 5381.
5. A. YAMADA, W. W. WENAS, M. YOSHINO, M. KONAGAI and K. TAKAHASHI, Jpn. J. Appl. Phys. 30 (1991) L1152.
6. T. MARUYAMA and A. NAKAI, ibid. 28 (1989) L346.
7. M. SHIMIZU, T. KATAYAMA, T. SHIOSAKI and A. KAWABATA, J. Cryst. Growth 99 (1990) 399.
8. J. HU and R. G. GORDON, J. Appl. Phys. 71 (1992) 880.
9. W. WIELDRAAIJER, J. VAN BALEN BLANKEN and E. W. KUIPERS, J. Cryst. Growth 126 (1993) 305.
10. P. SOULETIE, S. BETHKE, B. W. WESSELS and H. PAN, ibid. 86 (1988) 248.
11. G. L. MAR, P. Y. TIMBRELL and R. N. LAMB, Chem. Mater. 7 (1995) 1890.
12. K. KOBAYASHI, T. MATSUBARA, S. MATSUSHIMA, S. SHIRAKATA, S. ISOMURA and G. OKADA, Thin Solid Films 266 (1995) 106.
13. T. MARUYAMA and J. SHIONOYA, J. Mater. Sci. Lett. 11 (1992) 170.
14. T. MINAMI, H. SATO, H. SONOHARA, S. TAKATA, T. MIYATA and I. FUKUDA, Thin Solid Films 253 (1994) 14.
15. K. KAMATA, J. NISHINO, S. OHSHIO, K. MARUYAMA and M. OHTUKI, J. Amer. Ceram. Soc. 77 (1994) 505.
16. T. MINAMI, H. SONOHARA, S. TAKATA and H. SATO, Jpn. J. Appl. Phys. 33 (1994) L743.
17. H. SATO, T. MINAMI, T. MIYATA, S. TAKATA and M. ISHII, Thin Solid Films 246 (1994) 65.
18. Y. NATSUME, H. SAKATA, T. HIRAYAMA and H. YANAGIDA, J. Appl. Phys. 72 (1992) 4203.
19. N. D. KUMAR, M. N. KAMALASANAN and S. CHANDRA, Appl. Phys. Lett. 65 (1994) 1373.
20. J. AULD, D. J. HOULTON, A. C. JONES, S. A. RUSHWORTH, M. A. MALIK, P. O'BRIEN and G. W. CRITCHLOW, J. Mater. Chem. 4 (1994) 1249.
21. L. M. ATAGI, D. M. HOFFMAN, J.-R. LIU, Z. ZHENG, W.-K. CHU, R. R. RUBIANO, R. W. SPRINGER and D. C. SMITH, Chem. Mater. 6 (1994) 360.
22. T. TABUCHI, Y. SAWADO, K. UEMATSU and S. KOSHIBA, Jpn. J. Appl. Phys. 30 (1991) L1974.
23. J. G. NOLTES, Rec. Trav. Chim. 84 (1965) 126.
24. J. BOERSMA and J. G. NOLTES, Tetrahedron Lett. (1966) 1521.
25. R. FIX, R. G. GORDON and D. M. HOFFMAN, Chem. Mater. 3 (1991) 1138.