Optimization of BARC for nonplanar lithography by three-dimensional electromagnetic simulation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3183, Issue , 1997, Pages 91-103

  Yeung, Michael S ^a   Barouch, Eytan ^a  

^a BOSTON UNIVERSITY   (United States)

Author keywords

Bottom antireflective coating; Nonplanar lithography simulation

Indexed keywords

BOTTOM ANTIREFLECTIVE COATING; DEFOCUS; DIFFRACTION ORDERS; ELECTROMAGNETIC SCATTERINGS; ELECTROMAGNETIC SIMULATIONS; IMAGE INTENSITY DISTRIBUTIONS; LITHOGRAPHY SIMULATORS; MASK GEOMETRIES; NONPLANAR LITHOGRAPHY SIMULATION; SETUP PHASE;

DIFFRACTION; MASKS; THREE DIMENSIONAL;

SCATTERING;

EID: 57649130684     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.280555     Document Type: Conference Paper

References (8)

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