Optical in situ monitoring in LED device production

Solid State Technology

Volumn 51, Issue 11, 2008, Pages 26-27

  Haberland, K ^a  

^a LayTec GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GROWTH (MATERIALS); OPTIMIZATION; SEMICONDUCTOR QUANTUM WELLS;

ACTIVE LAYERS; EMISSION WAVELENGTHS; GROWTH PROCESSES; IN SITU MONITORING; INDIUM CONTENTS; KEY PARAMETERS; LED DEVICES; MOCVD GROWTHS; OPTICAL-; PRECISE CONTROLS; PROCESS OPTIMIZATIONS; QUANTUM WELLS; WAFER TEMPERATURES;

PROCESS ENGINEERING;

EID: 57449114705     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (3)

1. F. Brunner, A. Knauer, T. Schenk, M. Weyers, J-T. Zettler, "Quantitative Analysis of in situ Wafer Bowing Measurements for III-Nitride Growth on Sapphire," Jour, of Crystal Growth 310, pp. 2432 - 2438, 2008.
2. Presentation of S. Srinivasan et al. during China SSL Forum 2007.
3. A. Knauer, I, T. Kolbe, S. Einfeldt, M. Weyers, M. Kneissl, T. Zettler, "Optimization of InGaN/(In,Al,Ga)N-based Near UV-LEDs by MQW Strain Balancing with in situ Wafer Bow Sensor," Physica status solidi, Proc. 3rd International Symposium on Semiconductor Light Emitting Devices (ISSLED) Phoenix, USA, April 27-May 2, 2008.