Fast repair activities towards dGMP hydroxyl radical adducts by silybin and its analogues

Journal of Radiation Research

Volumn 49, Issue 6, 2008, Pages 609-614

  Fu, Haiying ^a   Katsumura, Yosuke ^a,b   Lin, Mingzhang ^b   Hata, Kuniki ^a   Muroya, Yusa ^a   Hatano, Yoshihiko ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Antioxidants; Fast repair; Hydroxyl radicals; Silybin

Indexed keywords

ABSORPTION SPECTROSCOPY; NITROGEN OXIDES; RATE CONSTANTS; REPAIR; SOLUTIONS;

FAST REPAIR; HYDROXYL RADICALS; MONOPHOSPHATES; NEUTRAL PH; NITROUS OXIDE; PHENOXYL RADICAL; PULSE IRRADIATION; RADICAL-ADDUCTS; SILYBIN; TRANSIENT ABSORPTION SPECTRA;

FLAVONOIDS;

EID: 57349159376     PISSN: 04493060     EISSN: 13499157     Source Type: Journal    
DOI: 10.1269/jrr.08056     Document Type: Article

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