Development of an operational high refractive index resist for 193nm immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Zimmerman, Paul A ^a   Byers, Jeff ^a   Piscani, Emil ^a   Rice, Bryan ^a   Ober, Christopher K ^b   Giannelis, Emmanuel P ^b   Rodriguez, Robert ^b   Wang, Dongyan ^b   Whittaker, Andrew ^c   Blakey, Idriss ^c   Chen, Lan ^c   Dargaville, Bronwin ^c   Liu, Heping ^c  

^a SEMATECH   (United States)

^b Department of Obstetrics Gynecology

^c UNIVERSITY OF QUEENSLAND   (Australia)

Author keywords

Immersion lithography; Nanoparticles; Photoresist; Refractive index

Indexed keywords

193NM IMMERSION LITHOGRAPHIES; 193NM RESISTS; ABSORBANCE; HIGH INDICES; HIGH REFRACTIVE INDICES; IMMERSION LITHOGRAPHIES; IMMERSION LITHOGRAPHY; MATERIALS DEVELOPMENTS; NUMERICAL APERTURES; ON LINES; OVERALL SYSTEMS; PROCESS LATITUDES; RESIST SYSTEMS;

LENSES; LIGHT REFRACTION; OPTICAL INSTRUMENTS; OPTICAL PROPERTIES; PHOTOLITHOGRAPHY; PHOTORESISTS; POLYMERS; REFRACTIVE INDEX; REFRACTOMETERS; ROUGHNESS MEASUREMENT;

NANOPARTICLES;

EID: 57349143821     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772871     Document Type: Conference Paper

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