Options for high index fluids for third generation 193i lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6923, Issue , 2008, Pages

  Kruger, Seth ^a   Revuru, Srividya ^a   Zhang, Shao Zhong ^a   Vaughn II, Dimitri D ^a   Block, Eric ^a   Zimmerman, Paul ^b   Brainard, Robert L ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Absorbance; HIF; High index fluids; Immersion lithography; Index of refraction

Indexed keywords

ABSORBANCE; HIF; HIGH INDEX FLUIDS; IMMERSION LITHOGRAPHY; INDEX OF REFRACTION;

ACETYLENE; AMMONIUM COMPOUNDS; CYANIDES; FUNCTIONAL GROUPS; OPTICAL PROPERTIES; ORGANIC COMPOUNDS; PARAFFINS; PHOTOLITHOGRAPHY; REFRACTIVE INDEX;

HYDROCARBONS;

EID: 57349143810     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772994     Document Type: Conference Paper

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3. Peng, Sheng; French, Roger H.; Qiu, Weiming; Wheland, Robert C.; Yang, Min; Lemon, Michael F.; Crawford, Michael K. Second generation fluids for 193 nm immersion lithography. SPIE Proceedings (2005), 5754, 427-434.
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