Photomodulated thermoreflectance microscopy applied on ion-implanted materials

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 12, 2008, Pages 3767-3770

  Sherifi, C ^a   Papademetriou, M D ^a   Nestoros, M ^b   Christofides, C ^a  

^a UNIVERSITY OF CYPRUS   (Cyprus)

^b UNIVERSITY OF NICOSIA   (Cyprus)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER RECOMBINATIONS; EXPERIMENTAL SET-UP; FREQUENCY SCANS; FUTURE RESEARCH DIRECTIONS; HIGH RESOLUTIONS; IMPLANTED MATERIALS; NON CONTACTS; SI WAFERS;

NANOTECHNOLOGY; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON WAFERS;

NANOELECTRONICS;

EID: 57349116781     PISSN: 18626351     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssc.200780199     Document Type: Conference Paper

References (11)

1. H. Ryssel and I. Ruge, Ion Implantation (Wiley, New York, 1986).
2. A. Rosencwaig, in: Photoacoustic and Thermal Wave Phenomena in Semiconductors, edited by A. Mandelis (North Holland, New York, 1987), chap. 5.
3. A. Rosencwaig, J. Opsal, W. L. Smith, and D. L. Willenborg, Appl. Phys. Lett. 47, 584 (1985).
4. I. A. Vitkin, C. Christofides, and A. Mandelis, Appl. Phys. Lett. 54, 2392 (1989).
5. C. Christofides, in: Ion Implanted Semiconductors: Optical and Photothermal Characterization, edited by C. Christofides and G. Ghibaudo, Semiconductors and Semimetals, Vol. 46 (Academic Press, New York, 1996), chap. 4.
6. M. Nestoros, B. C. Forget, C. Christofides, and A. Seas, Phys. Rev. B 51, 14115 (1995).
7. A. Othonos, C. Christofides, and E. Loizidou, J. Appl. Phys. 94, 7121 (2003).
8. A. Mansanares, T. Velinov, Z. Bozoki, D. Fournier, and C. Boceara, J. Appl. Phys. 75, 3344 (1994).
9. B. C.Forget, I. Barbereau, and D. Fournier, Appl. Phys. Lett. 69, 1107 (1996).
10. T. Ikari, J. P. Roger, and D. Fournier, Rev. Sci. Instrum. 74, 553 (2003).
11. N. C. Papanicolaou, M. Nestoros, and C. Christofides, J. Neur., Par. & Sci. Comp. 15, 165 (2007).