On the low-temperature oxidation and ultrathin oxide growth on zirconium in the presence of atomic oxygen: A modeling study

Journal of Physical Chemistry C

Volumn 112, Issue 46, 2008, Pages 17877-17882

  Sankaranarayanan, Subranianian K R S ^a   Ramanathan, Shriram ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY BARRIERS; ATOMIC OXYGENS; DYNAMIC CORRELATIONS; EXPERIMENTAL INVESTIGATIONS; MODELING STUDIES; MOLECULAR DYNAMICS SIMULATIONS; NANOSCALE OXIDES; NATURAL OXIDATIONS; OXIDE GROWTHS; OXIDE SCALES; OXYGEN DEFICIENTS; OXYGEN DIFFUSIVITIES; SIMULATION RESULTS; TEMPERATURE OXIDATIONS; TEMPERATURE RANGES; ULTRATHIN OXIDES;

ACTIVATION ENERGY; ATOMIC PHYSICS; ATOMS; CHEMICAL OXYGEN DEMAND; DYNAMICS; GROWTH (MATERIALS); GROWTH KINETICS; MOLECULAR DYNAMICS; NONMETALS; OXIDATION; OXIDE FILMS; OXYGEN; QUANTUM CHEMISTRY; SCALE (DEPOSITS); ZIRCONIA; ZIRCONIUM;

MOLECULAR OXYGEN;

EID: 57249087375     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp804872u     Document Type: Article

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