Langmuir-Blodgett films of C60 and C60O on Silicon: Islands, rings and grains

Thin Solid Films

Volumn 517, Issue 5, 2009, Pages 1650-1654

  Yan, Cong ^a   Dybek, Aneta ^b   Hanson, Claire ^c   Schulte, Karina ^a   Cafolla, A A ^c   Dennis, John ^b   Moriarty, Philip ^a  

^a UNIVERSITY OF NOTTINGHAM   (United Kingdom)

^b QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

^c DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

Atomic force microscopy; Fullerenes; Langmuir Blodgett; Monolayer; Silicon

Indexed keywords

AGGLOMERATION; AROMATIC HYDROCARBONS; ELECTRON ENERGY LEVELS; FILM PREPARATION; FULLERENES; HYDROGEN; HYDROGEN BONDS; MULTILAYERS; O RINGS; OXIDE FILMS; PHASE INTERFACES; PHENOLS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; THICK FILMS; TWO DIMENSIONAL;

AIR INTERFACES; ATOMIC FORCE MICROSCOPY; BREWSTER ANGLE MICROSCOPIES; DO-MAINS; EXPERIMENTAL CONDITIONS; HIGH DENSITIES; HYDROGEN BONDINGS; LANGMUIR FILMS; LANGMUIR-BLODGETT; LOW CONCENTRATIONS; MEDIATED INTERACTIONS; MOLECULAR THIN FILMS; MORPHOLOGICAL DIFFERENCES; SI(111) SUBSTRATES; SOLVENT EVAPORATIONS; SUBPHASE; WATER SURFACES;

LANGMUIR BLODGETT FILMS;

EID: 56949087578     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.10.015     Document Type: Article

References (33)

1. Altman E.I., and Colton R.J. Surf. Sci. 295 (1993) 13
2. Xue Q.K., Hashizume T., and Sakurai T. Prog. Surf. Sci. 56 (1997) 1
3. Rafii-Tabar H., and Ghafoori-Tabrizi K. Prog. Surf. Sci. 67 (2001) 217
4. Murphy T.A., Pawlik T., Weidinger A., Hohne M., Alcala R., and Spaeth J.M. Phys. Rev. Lett. 77 (1996) 1075
5. Maliszewskyj N.C., Heiney P.A., Jones D.R., Strongin R.M., Cichy M.A., and Smith A.B. Langmuir 9 (1993) 1439
6. Creggan K.M., Robbins J.L., Millar J.M., Sherwood R.D., Tindall P.J., Smith A.B., McCauley J.P., Jones D.R., Gallagher R.T., and Cox D.M. J. Am. Chem. Soc. 114 (1992) 1103
7. Wang B.-C., Chen L., Lee K.-J., and Cheng C.-Y. J. Mol. Struc. (Theochem) 469 (1999) 127
8. Yanagida M., Takahara A., and Kajiyama T. Bull. Chem. Soc. Jpn. 73 (2000) 1429
9. Yanagida M., Kuri T., and Kajiyama T. Chem. Lett. 26 (1997) 911
10. Imae T., and Ikeo Y. Supramol. Sci. 5 (1998) 61
11. Liang L., and Fang Y. Spectrochim. Acta A 69 (2008) 113
12. Nakamura T., Tachibana H., Yumura M., Matsumoto M., Azumi R., Tanaka M., and Kawabata Y. Langmuir 8 (1992) 4
13. Obeng Y.S., and Bard A.J. J. Am. Chem. Soc. 113 (1991) 6279
14. Back R., and Lennox R.B. J. Phys. Chem. 96 (1992) 8149
15. Bulhões L.O.S., Obeng S.Y., and Bard A.J. Chem. Mater. 5 (1993) 110
16. Castillo R., Ramos S., and Ruiz-Garcia J. J. Phys. Chem. 100 (1996) 15235
17. Evans A.K. J. Phys. Chem. B 102 (1998) 7016
18. Felder D., Gutiérrez Nava M., del Pilar Carreón M., Eckert J., Luccisana M., Schall C., Masson P., Gallani J., Heninrich B., Guillon D., and Nierengarten J. Helv. Chim. Acta 85 (2002) 288
19. Jonas U., Cardullo F., Belik P., Diederich F., Gügel A., Harth E., Herrmann A., Isaacs L., Müllen K., Ringsdorf H., Thilgen C., Uhlmann P., Vasella A., Waldraff C.A.A., and Walter M. Chem. Eur. J. 1 (1995) 243 and references therein
20. Cardullo F., Diederich F., Echegoyen L., Habicher T., Jayaraman N., Leblanc R.M., Stoddart J.F., and Wang S. Langmuir 14 (1998) 1955
21. Oh-ishi K., Okamura J., Ishi-i T., Sano M., and Shinkai S. Langmuir 15 (1999) 2224
22. Wang P., Chen B., Metzger R.M., Da Ros T., and Prato M. J. Mater. Chem. 7 (1997) 2397
23. Milliken J., Dominguez D.D., Nelson H.H., and Barger W.R. Chem. Mater. 4 (1992) 252
24. Li X., Yang S., Xu Y., Liu Y., and Zhu D. Thin Solid Films 413 (2002) 231
25. Gao Y., Tang Z.X., Watkins E., Majewski J., and Wang H.L. Langmuir 21 (2005) 1416
26. Tian Y., Fendler J.H., Hungerbühler H., Guldi D.M., and Asmus K.-D. Mater. Sci. Eng. C 7 (1999) 67
27. Uemura S., Sakata M., Hirayama C., and Kunitake M. Langmuir 20 (2004) 9198
28. Moriarty P., Taylor M.D.R., and Brust M. Phys. Rev. Lett. 89 (2002) 248303
29. Martin C.P., Blunt M.O., Pauliac-Vaujour E., Stannard A., Moriarty P., Vancea I., and Thiele U. Phys. Rev. Lett. 99 (2007) 116103
30. Rabani E., Reichman D.R., Geissler P.L., and Brus L.E. Nature 426 (2003) 271
31. Pauliac-Vaujour E., Stannard A., Martin C.P., Blunt M.O., Notingher I., Moriarty P.J., Vancea I., and Thiele U. Phys. Rev. Lett. 100 (2008) 176102
32. Ma Y.R., Moriarty P., and Beton P.H. Phys. Rev. Lett. 78 (1997) 2588
33. 60O Langmuir films were transferred to hydrophobic silicon surfaces using a vertical dipping method. At best, a very small areal density of three dimensional clumps of molecules was observed. We did not attempt a horizontal transfer method for this study.