Development of an in-process confocal positioning system for nano-stereolithography using evanescent light

International Journal of Precision Engineering and Manufacturing

Volumn 9, Issue 3, 2008, Pages 51-54

  Kajihara, Yusuke ^a   Takeuchi, Toru ^a   Takahashi, Satoru ^a   Takamasu, Kiyoshi ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Confocal system; Evanescent light; In process and on line metrology; Nanostereolithography; Optical system

Indexed keywords

EID: 56549118828     PISSN: 12298557     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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