Thermally induced reaction and diffusion of carbon films on Ni(1 1 1) and Ni(1 0 0)

Surface Science

Volumn 602, Issue 23, 2008, Pages 3623-3631

  Wiltner, A ^a   Linsmeier, Ch ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

Carbides; Carbon; Nickel; Surface chemical reaction; X ray photoelectron spectroscopy

Indexed keywords

CARBIDES; CARBON; CHEMICAL REACTIONS; DIFFUSION; ELECTRON SPECTROSCOPY; NICKEL; NICKEL ALLOYS; PHASE INTERFACES; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOIONIZATION; PHOTONS; SEMICONDUCTOR DOPING; SPECTRUM ANALYSIS; SUBSTRATES; SURFACE REACTIONS; THERMAL SPRAYING; TISSUE; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBIDE FORMATIONS; CARBON DIFFUSIONS; ELEMENTAL CARBONS; HIGHER TEMPERATURES; ROOM TEMPERATURES; SIGNAL INTENSITIES; SURFACE CHEMICAL REACTION; THERMAL TREATMENTS; THIN CARBON FILMS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

CARBON FILMS;

EID: 56349112813     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.10.003     Document Type: Article

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