Finite element simulation of absorbance modulation optical lithography

Proceedings of the 2008 International Conference on Nanoscience and Nanotechnology, ICONN 2008

Volumn , Issue , 2008, Pages 184-187

  Foulkes, John ^a   Blaikie, Richard ^a  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

Author keywords

Absorbance modulation optical lithography; Electromagnetic simulations; Nanolithography; Photochromic

Indexed keywords

ELECTROMAGNETIC WAVES; FINITE ELEMENT METHOD; LIGHT; LIGHT SOURCES; LIGHTING; NANOLITHOGRAPHY; NANOSCIENCE; NANOTECHNOLOGY; OPTICAL PROPERTIES; PHOTOCHROMISM; PHOTOLITHOGRAPHY;

ABSORBANCE; ABSORBANCE MODULATION OPTICAL LITHOGRAPHY; ELECTROMAGNETIC SIMULATIONS; FINITE ELEMENT METHOD SIMULATIONS; FINITE ELEMENT SIMULATIONS; GRATING PERIODS; INCIDENT INTENSITIES; NEAR FIELDS; OPTICAL LITHOGRAPHIES; OPTICAL-; PHOTOCHROMIC; PHOTOCHROMIC LAYERS;

MODULATION;

EID: 56349112003     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICONN.2008.4639277     Document Type: Conference Paper

References (8)

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