New plasma processes for antireflective structures on plastics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7101, Issue , 2008, Pages

  Schulz, U ^a   Munzert, P ^a   Leitel, R ^b   Bollwahn, N ^a   Wendling, I ^b   Kaiser, N ^a   Tunnermann A ^a,b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Anti reflection; Antireflective nanostructure; Ion source; Optical coating; Plasma etching; Plastic optics; PMMA; Surface wettability; Zeonex

Indexed keywords

ABS RESINS; ETCHING; FILM PREPARATION; FLUORINE; ION SOURCES; LIGHT; NANOSTRUCTURES; OPTICAL COATINGS; PHOTORESISTS; PLASMA ETCHING; PLASMA SOURCES; PLASTIC COATINGS; POLYMERS; SILICA; SILICON COMPOUNDS; THICK FILMS; THIN FILMS;

ANTI-REFLECTION; ANTIREFLECTIVE NANOSTRUCTURE; PLASTIC OPTICS; PMMA; SURFACE WETTABILITY; ZEONEX;

PLASMAS;

EID: 56249145531     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.796705     Document Type: Conference Paper

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