|
|
Volumn 39, Issue 12, 2008, Pages 1560-1563
|
|
RTD characteristics for micro-thermal sensors
a
|
|
Author keywords
MgO; Pt RTD; TCR; Thermal sensor
|
|
Indexed keywords
ANNEALING;
CHEMICAL REACTIONS;
ELECTRIC REACTORS;
ELECTRON TUBE DIODES;
GRAFTING (CHEMICAL);
MAGNETRON SPUTTERING;
RESONANT TUNNELING;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR DIODES;
SENSORS;
SILICON;
SILICON COMPOUNDS;
SPIN GLASS;
SURFACE REACTIONS;
SYNTHESIS (CHEMICAL);
TEMPERATURE MEASURING INSTRUMENTS;
THERMAL CONDUCTIVITY OF SOLIDS;
THERMOMETERS;
THICK FILMS;
THIN FILM DEVICES;
THIN FILMS;
ADHESIVE PROPERTIES;
ANNEALING TEMPERATURES;
BULK VALUES;
ELECTRICAL CHARACTERISTICS;
MAGNETRON SPUTTERING METHODS;
MGO;
PT THIN FILMS;
PT-RTD;
RESISTANCE THERMOMETER DEVICES;
RESISTANCE VALUES;
RF SPUTTERING METHODS;
SENSOR APPLICATIONS;
SENSOR MATERIALS;
SI SUBSTRATES;
SPIN-ON;
SURFACE RESISTIVITIES;
TCR;
TEMPERATURE CO-EFFICIENT;
TEMPERATURE RANGES;
THERMAL SENSOR;
PLATINUM;
|
|
EID: 56249129324
PISSN: 00262692
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mejo.2008.02.028 Document Type: Article |
|
Times cited : (18)
|
|
References (9)
|
