Study of surface nitriding on uranium by plasma immersion ion implantation

Cailiao Rechuli Xuebao/Transactions of Materials and Heat Treatment

Volumn 29, Issue 5, 2008, Pages 139-142

  Long, Zhong ^a   Liu, Ke Zhao ^a   Bai, Bin ^a   Liang, Hong Wei ^a   Yan, Dong Xu ^a  

^a RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

Nitriding; Plasma immersion ion implantation (PIII); Temperature; Uranium

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CASE HARDENING; ION BOMBARDMENT; ION IMPLANTATION; IONS; NITRIDES; NITRIDING; PLASMAS; TRANSURANIUM ELEMENTS; URANIUM;

AUGER ELECTRON SPECTRUMS; KEY PARAMETERS; NITRIDE LAYERS; NITRIDING DEPTHS; NITROGEN ION IMPLANTATIONS; PLASMA IMMERSION ION IMPLANTATION (PIII); PLASMA IMMERSION ION IMPLANTATIONS; SURFACE NITRIDING;

PLASMA APPLICATIONS;

EID: 55949126420     PISSN: 10096264     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

1. Moller W. Plasma-immersion ion implantation for diffusive treatment [J]. Surface and Coatings Technology, 1999, 116-119: 1-10.
2. + ion implantation [J]. Journal of Nuclear Materials, 2000, 281: 182-190.
3. Blanchard J P. Target temperature prediction for plasma source ion implantation [J]. J Vac Sci Technol B, 1994, 12 (2): 3-4.
4. Anders A. Handbook of plasma immersion ion implantation and deposition [J]. Lawrence Berkeley National Laboratory, 2001, 17 (2): 417-426.