Patterned fabrication of single ZnO nanorods and measurement of their optoelectrical characteristics

Journal of Nanoscience and Nanotechnology

Volumn 8, Issue 9, 2008, Pages 4377-4381

  Yu, Chun Wei ^a   Lai, Shang Hung ^a   Wang, Teng Yi ^a   Lan, Ming Der ^a   Ho, Mon Shu ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

Nanorod; Nanoshpere lithography; Si; ZnO

Indexed keywords

EMISSION SPECTROSCOPY; ENERGY GAP; FIELD EMISSION DISPLAYS; GOLD COMPOUNDS; II-VI SEMICONDUCTORS; NANORODS; NANOSPHERES; SILICON; ZINC OXIDE;

CONDUCTIVE AFM; NANOSPHERE LITHOGRAPHY; OPTOELECTRICAL; SEM AND TEM; SI(111) SUBSTRATE; UV EMISSIONS; VAPOR-LIQUID-SOLID PROCESS; ZNO NANOROD;

SILICON COMPOUNDS;

EID: 55949088240     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (19)

1. R. Köenkamp, K. Boedecker, M. C. Lux-Steiner, M. Poschenrieder, F. Zenia, C. Levy-Clement, and S. Wagner, Appl. Phys. Lett. 77, 2575 (2000).
2. M. Huang, Y. Wu, H. Feick, N. Tran, E. Weber, and P. Yang, Adv. Mater. 13, 113 (2001).
3. Z. G. Bai, D. P. Yu, H. Z. Zhang, Y. Ding, X. Z. Gai, Q. L. Hang, G. C. Hiong, and S. Q. Feng, Chem. Phys. Lett. 303, 311 (1999).
4. Y. Wu, R. Fan, and P. Yang, Nano Lett. 2, 83 (2002).
5. S. lijima, Nature 354, 56 (1991).
6. Z. W. Pan, Z. R. Dai, and Z. L. Wang, Science 291, 1947 (2001).
7. W. Han, S. Fan, Q. Li, W. Liang, B. Gu, and D. Yu, Chem. Phys. Lett. 265, 374 (1997).
8. D. C. Look, Mater. Sci. Eng. B 80, 383 (2001).
9. H. Chik, J. Liang, S. G. Cloutier, N. Kouklin, and J. M. Xu, Appl. Phys. Lett. 84, 3376 (2004).
10. Y. W. Heo, L. C. Tien, D. P. Norton, B. S. Kang, F. Ren, B. P. Gila, and S. J. Pearton, Appl. Phys. Lett. 85, 2002 (2004).
11. S. Y. Li, C. Y. Lee, and T. Y. Tseng, J. Cryst. Growth 247, 357 (2003).
12. Y. B. Li, Y. Bando, T. Sato, and K. Kurashima, Appl. Phys. Lett. 81, 144 (2002).
13. M. H. Huang, S. Mao, H. Feick, H. Yan, Y. Wu, H. Kind, E. Weber, R. Russo, and P. Yang, Science 292, 1897 (2001).
14. B. D. Yao, Y. F. Chan, and N. Wang, Appl. Phys. Lett. 81, 757 (2002).
15. D. Banerjee, J. Y. Lao, D. Z. Wang, J. Y. Huang, Z. F. Ren, D. Sleeves, B. Kimball, and M. Sennett, Appl. Phys. Lett. 83, 2061 (2003).
16. J. C. Hulteen and R. P. Van Duyne, J. Vac Sci. Technol. A 13, 1553 (1995).
17. M. Yazawa, M. Koguchi, A. Muto, M. Ozawa, and K. Hiruma, Appl. Phys. Lett. 61, 2051 (1992).
18. R. Jayavel, T. Mochiku, S. Ooi, and K. Hirata, J. Cryst. Growth 229, 339 (2001).
19. H. J. Fan, B. Fuhrmann, R. Scholz, F. Syrowatka, A. Dadgar, A. Krost, and M. Zacharias, J. Cryst. Growth 287, 34 (2006).