Non-relief-pattern lithography patterning of solution processed organic semiconductors

Advanced Materials

Volumn 20, Issue 21, 2008, Pages 4145-4147

  Park, Sung Kyu ^a,b   Mourey, Devin A ^c   Subramanian, Sankar ^d   Anthony, John E ^d   Jackson, Thomas N ^a  

^a The Pennsylvania State University   (United States)

^b Korea Electronic Technology Institute (KETI)   (South Korea)

^c PENNSYLVANIA STATE UNIVERSITY   (United States)

^d UNIVERSITY OF KENTUCKY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; ELECTRIC CONDUCTIVITY; ELECTRODES; GATE DIELECTRICS; GATES (TRANSISTOR); ION BEAMS; LITHOGRAPHY; NICKEL ALLOYS; OXYGEN; PLASMA DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR MATERIALS; SILICA; SILICON COMPOUNDS; SURFACE CHEMISTRY; SURFACE TENSION; THICK FILMS; THIN FILM CIRCUITS; THIN FILM DEVICES; THIN FILM TRANSISTORS; TRANSISTORS;

ACTIVE LAYERS; CROSS OVERS; DEVICE PERFORMANCES; GATE ELECTRODES; INSULATION LAYERS; LAYER DEPOSITIONS; LITHOGRAPHIC PROCESSES; ORGANIC SEMICONDUCTORS; ORGANIC THIN FILM TRANSISTORS; OXYGEN PLASMAS; PATTERN LITHOGRAPHIES; REACTIVE IONS; SELF-ASSEMBLED MONOLAYERS; SILICON DIOXIDES; SOURCE/DRAIN ELECTRODES; SURFACE ENERGIES;

SEMICONDUCTING ORGANIC COMPOUNDS;

EID: 55749105328     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200801133     Document Type: Article

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