|
|
Volumn 354, Issue 52-54, 2008, Pages 5459-5465
|
|
Water diffusion coefficient measurements in deposited silica coatings by the substrate curvature method
|
|
Author keywords
Diffusion and transport; Films and coatings; Water in glass
|
|
Indexed keywords
ATMOSPHERIC HUMIDITY;
COATINGS;
DIFFUSION;
DIFFUSION IN LIQUIDS;
LITHIUM COMPOUNDS;
METEOROLOGY;
MOISTURE;
OXIDES;
SEMICONDUCTOR DOPING;
SILICA;
SILICON;
SUBSTRATES;
VAPORS;
WATER VAPOR;
DIFFUSION COEFFICIENTS;
DIFFUSION OF WATERS;
EQUILIBRATION TIMES;
FILMS AND COATINGS;
HUMIDITY CHANGES;
IN-SITU;
ROOM TEMPERATURES;
SILICA COATINGS;
SILICON SUBSTRATES;
SUBSTRATE CURVATURES;
WATER DIFFUSION COEFFICIENTS;
DIFFUSION COATINGS;
|
|
EID: 55649116394
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2008.09.008 Document Type: Article |
|
Times cited : (12)
|
|
References (16)
|
