GeSe/GeS nanomultilayers prepared by pulsed laser deposition

Journal of Non-Crystalline Solids

Volumn 354, Issue 52-54, 2008, Pages 5421-5424

  Nemec P ^a   Takats, V ^b   Csik, A ^b   Kokenyesi, S ^b  

^a UNIVERSITY OF PARDUBICE   (Czech Republic)

^b UNIVERSITY OF DEBRECEN   (Hungary)

Author keywords

Amorphous films A1955; Diffusion D210; Laser deposition L105; Multilayers M360

Indexed keywords

ANNEALING; FILM PREPARATION; LASERS; LIGHT; MODULATION; MULTILAYERS; OPTICAL PROPERTIES; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; REFRACTIVE INDEX;

ATOMIC FORCES; BLUE SHIFTS; DIRECT SURFACE PATTERNING; INTERDIFFUSION PROCESSES; LASER DEPOSITION L105; MODULATION PERIODS; MULTILAYERED MATERIALS; NANO MULTILAYERS; PULSED LASER DEPOSITION TECHNIQUES; PULSED LASERS; WAVELENGTH ABSORPTIONS; X-RAY DIFFRACTIONS;

AMORPHOUS FILMS;

EID: 55649115088     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2008.09.006     Document Type: Article

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