P-AgCoO2/n-ZnO heterojunction diode grown by rf magnetron sputtering

Bulletin of Materials Science

Volumn 31, Issue 5, 2008, Pages 753-758

  Vanaja, K A ^a   Bhatta, Umananda M ^b   Ajimsha, R S ^a   Jayalekshmi, S ^a   Jayaraj, M K ^a  

^a Department of Physics   (India)

^b INSTITUTE OF PHYSICS   (India)

Author keywords

HRTEM; P n junction; P type; Rf sputtering

Indexed keywords

AMORPHOUS FILMS; DIFFRACTION; DISTILLATION; HETEROJUNCTIONS; HOLOGRAPHIC INTERFEROMETRY; MAGNETRONS; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEEBECK COEFFICIENT; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR DIODES; SEMICONDUCTOR JUNCTIONS; THICK FILMS; THIN FILMS; ZINC ALLOYS; ZINC OXIDE;

BANDGAP; BULK POWDERS; C -AXIS; GLASS SUBSTRATES; HETEROJUNCTION DIODES; HRTEM; HYDROTHERMAL PROCESSES; OPTICAL-; P-N JUNCTION; P-TYPE; PULSED LASERS; RF MAGNETRON SPUTTERING; RF SPUTTERING; TEMPERATURE DEPENDENCES; VISIBLE REGIONS; ZNO:AL THIN FILMS;

MAGNETRON SPUTTERING;

EID: 55649099896     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12034-008-0119-9     Document Type: Article

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