Simultaneous phosphorus and Si self-diffusion in extrinsic, isotopically controlled silicon heterostructures

Materials Research Society Symposium - Proceedings

Volumn 810, Issue , 2004, Pages 77-83

  Silvestri, Hughes H ^a,b   Bracht, Hartmut A ^c   Sharp, Ian D ^a,b   Hansen, John ^d   Nylandsted Larsen, Arne ^d   Haller, Eugene E ^a,b  

^a Lawrence Berkeley National Laboratory   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF MÜNSTER   (Germany)

^d AARHUS UNIVERSITY   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); DIFFUSION; DOPING (ADDITIVES); MATHEMATICAL MODELS; MULTILAYERS; PHOSPHORUS; SILICON; THERMAL EFFECTS;

DOPANTS; MULTILAYER STRUCTURE; PHOSPHORUS IONS; SELF DIFFUSION;

HETEROJUNCTIONS;

EID: 5544325297     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-810-c3.3     Document Type: Conference Paper

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