Effect of SiOH and SiCl on ArF-excimer laser-induced absorption in soot-remelted silica

Journal of Applied Physics

Volumn 81, Issue 12, 1997, Pages 8011-8017

  Kuzuu, Nobu ^a   Taga, Toshiyuki ^b   Kamisugi, Naoyoshi ^c  

^a UNIVERSITY OF FUKUI   (Japan)

^b TOSOH CORPORATION   (Japan)

^c Yamaguchi Company Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5544270659     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365405     Document Type: Article

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