OH content dependence of ArF excimer-laser-induced absorption in type III fused silica

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2714, Issue , 1996, Pages 71-79

  Kuzuu, Nobu ^a  

^a Nippon Silica Glass Co Ltd   (Japan)

Author keywords

ArF excimer laser; Excimer laser induced absorption; Synthetic fused silica

Indexed keywords

ABSORPTION; EXCIMER LASERS; GAS LASERS; HELIUM; LASER DAMAGE; LASERS; OPTICAL MATERIALS; OXIDES; SILICA; THEOREM PROVING;

ARF EXCIMER LASER; ARF LASERS; EXCIMER LASER INDUCED ABSORPTION; INDUCED ABSORPTIONS; NO ABSORPTIONS; OH CONTENTS; REDUCING CONDITIONS; SYNTHETIC FUSED SILICA;

FUSED SILICA;

EID: 0346432970     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240372     Document Type: Conference Paper

References (9)

1. N. Kuzuu, Sekiei Garasu no Sekai (Introduction to Silica Glass Science and Technology), Kogyo Chosa Kai, Tokyo, Oct. 1995 (in Japanese)
2. D.L.Griscom,"Optical properties and structure of defects in silica glass", J. Ceram. Soc. Jpn., vol.99, pp.923-942, Oct.1991
3. N.Kuzuu, Y.Komatsu and M.Murahara, "ArF-excimer1aser-induced emission and absorption bands in fused silica synthesized in reducing condition", Phys. Rev. B, vol. 44, pp. 9265-9270, Nov.1991
4. N.Kuzuu, Y.Komatsu and M.Murahara, "ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized under oxidizing condition", Phys. Rev. B, vol. 45, pp. 2050-2054, Feb.1992
5. N.Kuzuu and M.Murahara, "Effect of synthesis conditions on existence and nonexistence of the ArF-excimer-laser and x-ray induced B 2α band in type-III fused silica", Phys. Rev. B, vol. 52, pp324l-3247, Aug. 1995
6. N.Kuzuu, Y.Komatsu and M.Murahara, "Energy-density and repetition-rate dependence of the KrF-excimer-laser-induced 1.9-eV emission band in type-III fused silicas", Phys. Rev. B, vol. 47, pp. 3078-3082, Feb. 1993
7. N.Kuzuu, Y.Komatsu and M.Murahara, "Luminescence measurement of fused silica in the presence of excimer laser radiation", Optical fibers materials and processing, J.W.Fleming, G.H.Sigel,Jr., S.Takahashi and P.W.France Eds., Mat. Res. Soc. Proc, vol. 172, pp.1 19-124, MRS, Pittsburgh, 1990
8. N.Kuzuu, "Characteristics of fused silica as optical material for excimer laser beam", Rev. Laser Eng., vol. 19, pp.177484, Feb. 1991 (in Japanese)
9. H.Imai, K.Arai, J.Isoya, H.Hosono, Y.Abe and H.Imagawa, "Generation of E′ center and oxygen hole centers in synthetic silica glasses by γ irradiation", Phys. Rev. B, vol. 48, pp. 3116-3123, Aug. 1993