Roughening kinetics of reactively sputter-deposited Ti-Al-N films on Si(100)

Philosophical Magazine Letters

Volumn 83, Issue 10, 2003, Pages 627-634

  Liu, Z J ^a   Shum, P W ^a   Li, K Y ^a   Shen, Y G ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFUSION; KINETIC THEORY; MAGNETRON SPUTTERING; NUMERICAL METHODS; SPUTTER DEPOSITION; SUBSTRATES; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; SURFACE TREATMENT; SYNTHESIS (CHEMICAL); TITANIUM COMPOUNDS;

ROUGHENING KINETICS; SURFACE ROUGHENING; TITANIUM ALUMINUM NITROGEN FILMS;

SEMICONDUCTING SILICON;

EID: 0242365764     PISSN: 09500839     EISSN: None     Source Type: Journal    
DOI: 10.1080/09500830310001603731     Document Type: Article

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