SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 47, Issue 8 PART 1, 2008, Pages 6310-6311

Fabrication and current-voltage characteristics of Fe3Si/ CaF2/Fe3Si magnetic tunnel junction

(4) Harianto, Teddy a Sadakuni, Kenji a Akinaga, Hiro b Suemasu, Takashi a

a UNIVERSITY OF TSUKUBA (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

CaF2; Fe3Si; MBE; TMR

Indexed keywords

ACIDS; IRON COMPOUNDS; NITRIC ACID; SEMICONDUCTOR JUNCTIONS; SILICON; TUNNEL JUNCTIONS; TUNNELS;

BARRIER HEIGHTS; BARRIER THICKNESSES; CAF2; ETCH RATES; FE3SI; MAGNETIC TUNNEL JUNCTIONS; MBE; ROOM TEMPERATURES; SELECTIVE WET CHEMICAL ETCHINGS; SULFURIC SOLUTIONS; TMR; VOLTAGE CHARACTERISTICS;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 55149112115 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.47.6310 Document Type: Article

Times cited : (12)

References (23)

1
- 0029632353
- T. Miyazaki and N. Tezuka: J. Magn. Magn. Mater. 139 (1995) L231.
- (1995) J. Magn. Magn. Mater , vol.139
- Miyazaki, T.¹ Tezuka, N.²

2
- 11944262717
- J. S. Moodera, L. R. Kinder, T. M. Wong, and R. Meservey: Phys. Rcv. Lett. 74 (1995) 3273.
- (1995) Phys. Rcv. Lett , vol.74 , pp. 3273
- Moodera, J.S.¹ Kinder, L.R.² Wong, T.M.³ Meservey, R.⁴

3
- 0035900398
- S. A. Wolf, D. D. Awschalom, R. A. Buhrman, J. M. Daughton, S. von Molnár, M. L. Roukes, A. Y. Chtchelkanova, and D. M. Treger: Science 294 (2001) 1488.
- (2001) Science , vol.294 , pp. 1488
- Wolf, S.A.¹ Awschalom, D.D.² Buhrman, R.A.³ Daughton, J.M.⁴ von Molnár, S.⁵ Roukes, M.L.⁶ Chtchelkanova, A.Y.⁷ Treger, D.M.⁸

4
- 34547602940
- M. Julliere: Phys. Lett. A 54 (1975) 225.
- (1975) Phys. Lett. A , vol.54 , pp. 225
- Julliere, M.¹

5
- 10044257857
- S. Yuasa, T. Nagahama, A. Fukushima, Y. Suzuki, and K. Ando: Nat. Mater. 3 (2004) 868.
- (2004) Nat. Mater , vol.3 , pp. 868
- Yuasa, S.¹ Nagahama, T.² Fukushima, A.³ Suzuki, Y.⁴ Ando, K.⁵

6
- 85008460228
- in Japanese
- A. Ôsawa and T. Murata: Nihon Kinzoku Gakkaishi 4 (1940) 228 [in Japanese].
- (1940) Nihon Kinzoku Gakkaishi , vol.4 , pp. 228
- Ôsawa, A.¹ Murata, T.²

7
- 0026413243
- M. Hong, H. S. Chen, J. Kwo, A. R. Kortan, J. P. Mannaerts, B. E. Weir, and L. C. Feldman: J. Cryst. Growth 111 (1991) 984.
- (1991) J. Cryst. Growth , vol.111 , pp. 984
- Hong, M.¹ Chen, H.S.² Kwo, J.³ Kortan, A.R.⁴ Mannaerts, J.P.⁵ Weir, B.E.⁶ Feldman, L.C.⁷

8
- 0028409578
- J. Waliszewski, L. Dobrzyński, A. Malinowski, D. Satuła, K. Szymański, W. Prandl, Th. Brückel, and O. Schärpf: J. Magn. Magn. Mater. 132 (1994) 349.
- (1994) J. Magn. Magn. Mater , vol.132 , pp. 349
- Waliszewski, J.¹ Dobrzyński, L.² Malinowski, A.³ Satuła, D.⁴ Szymański, K.⁵ Prandl, W.⁶ Brückel, T.⁷ Schärpf, O.⁸

9
- 0001752799
- W. A. Hines, A. H. Menotti, J. I. Budnick, T. J. Burch, T. Litrenta, V. Niculescu, and K. Raj: Phys. Rev. B 13 (1976) 4060.
- (1976) Phys. Rev. B , vol.13 , pp. 4060
- Hines, W.A.¹ Menotti, A.H.² Budnick, J.I.³ Burch, T.J.⁴ Litrenta, T.⁵ Niculescu, V.⁶ Raj, K.⁷

10
- 0344514687
- J. Herfort, H. P. Schönherr, and K. H. Ploog: Appl. Phys. Lett. 83 (2003) 3912.
- (2003) Appl. Phys. Lett , vol.83 , pp. 3912
- Herfort, J.¹ Schönherr, H.P.² Ploog, K.H.³

11
- 2142649268
- S. Sugahara and M. Tanaka: Appl. Phys. Lett. 84 (2004) 2307.
- (2004) Appl. Phys. Lett , vol.84 , pp. 2307
- Sugahara, S.¹ Tanaka, M.²

12
- 33750926530
- R. Nakane, M. Tanaka, and S. Sugahara: Appl. Phys. Lett. 89 (2006) 192503.
- (2006) Appl. Phys. Lett , vol.89 , pp. 192503
- Nakane, R.¹ Tanaka, M.² Sugahara, S.³

13
- 33750722458
- T. Sadoh, M. Kumano, R. Kizuka, K. Ueda, A. Kenjo, and M. Miyao: Appl. Phys. Lett. 89 (2006) 182511.
- (2006) Appl. Phys. Lett , vol.89 , pp. 182511
- Sadoh, T.¹ Kumano, M.² Kizuka, R.³ Ueda, K.⁴ Kenjo, A.⁵ Miyao, M.⁶

14
- 37549028001
- K. Takeda, T. Yoshitake, D. Nakagauchi, T. Ogawa, D. Hara, M. Itakura, N. Kuwano, Y. Tomokiyo, T. Kajiwara, and K. Nagayama: Jpn. J. Appl. Phys. 46 (2007) 7846.
- (2007) Jpn. J. Appl. Phys , vol.46 , pp. 7846
- Takeda, K.¹ Yoshitake, T.² Nakagauchi, D.³ Ogawa, T.⁴ Hara, D.⁵ Itakura, M.⁶ Kuwano, N.⁷ Tomokiyo, Y.⁸ Kajiwara, T.⁹ Nagayama, K.¹⁰

15
- 0000085154
- M. Watanabe, T. Suemasu, S. Muratake, and M. Asada: Appl. Phys. Lett. 62 (1993) 300.
- (1993) Appl. Phys. Lett , vol.62 , pp. 300
- Watanabe, M.¹ Suemasu, T.² Muratake, S.³ Asada, M.⁴

16
- 0001430554
- A. Izumi, N. Matsubara, Y. Kushida, K. Tsutsui, and N. S. Sokolov: Jpn. J. Appl. Phys. 36 (1997) 1849.
- (1997) Jpn. J. Appl. Phys , vol.36 , pp. 1849
- Izumi, A.¹ Matsubara, N.² Kushida, Y.³ Tsutsui, K.⁴ Sokolov, N.S.⁵

17
- 23944499792
- T. Sunohara, K. Kobayashi, M. Umada, H. Yanagihara, E. Kita, H. Akinaga, and T. Suemasu: Jpn. J. Appl. Phys. 44 (2005) L715.
- (2005) Jpn. J. Appl. Phys , vol.44
- Sunohara, T.¹ Kobayashi, K.² Umada, M.³ Yanagihara, H.⁴ Kita, E.⁵ Akinaga, H.⁶ Suemasu, T.⁷

18
- 33646098180
- K. Kobayashi, T. Sunohara, M. Umada, H. Yanagihara, E. Kita, and T. Suemasu: Thin Solid Films 508 (2006) 78.
- (2006) Thin Solid Films , vol.508 , pp. 78
- Kobayashi, K.¹ Sunohara, T.² Umada, M.³ Yanagihara, H.⁴ Kita, E.⁵ Suemasu, T.⁶

19
- 34547810844
- K. Kobayashi, T. Suemasu, N. Kuwano, D. Hara, and H. Akinaga: Thin Solid Films 515 (2007) 8254.
- (2007) Thin Solid Films , vol.515 , pp. 8254
- Kobayashi, K.¹ Suemasu, T.² Kuwano, N.³ Hara, D.⁴ Akinaga, H.⁵

20
- 36048986293
- T. Harianto, K. Kobayashi, T. Suemasu, and H. Akinaga: Jpn. J. Appl. Phys. 46 (2007) L904.
- (2007) Jpn. J. Appl. Phys , vol.46
- Harianto, T.¹ Kobayashi, K.² Suemasu, T.³ Akinaga, H.⁴

21
- 9144258943
- J. G. Simmons: J. Appl. Phys. 34 (1963) 1793.
- (1963) J. Appl. Phys , vol.34 , pp. 1793
- Simmons, J.G.¹

22
- 0000787654
- R. A. Heaton and C. C. Lin: Phys. Rev. B 22 (1980) 3629.
- (1980) Phys. Rev. B , vol.22 , pp. 3629
- Heaton, R.A.¹ Lin, C.C.²

23
- 0004005306
- Wiley, New York
- S. M. Sze: Physics of Semiconductor Devices (Wiley, New York, 1981).
- (1981) Physics of Semiconductor Devices
- Sze, S.M.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.