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Volumn 47, Issue 9 PART 1, 2008, Pages 7403-7406
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Patterning properties of indium-tin oxide layer depending on the irradiation conditions of Nd:YVO4 laser beam
a
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Author keywords
Direct patterning; Indium tin oxide; Nd:YVO4 laser; Plasma display panel (PDP)
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Indexed keywords
ETCHING;
GALVANOMETERS;
GLASS;
LASERS;
LIME;
NEODYMIUM;
NEODYMIUM LASERS;
PLASMA DISPLAY DEVICES;
PLASMAS;
SCANNING;
TIN;
TITANIUM COMPOUNDS;
INDIUM;
BUS ELECTRODES;
DIRECT PATTERNING;
ETCHING PROPERTIES;
ETCHING SELECTIVITIES;
GALVANOMETRIC SCANNING;
GLASS SUBSTRATES;
IRRADIATION CONDITIONS;
ITO FILMS;
ND:YVO4 LASERS;
ND:YVO4 LASER;
OXIDE LAYERS;
PLASMA DISPLAY PANEL (PDP);
PLASMA DISPLAY PANELS;
PULSE REPETITION RATES;
REPETITION RATES;
SCANNING SPEEDS;
SPOT SIZES;
GALVANOMETRIC SCANNING SYSTEMS;
INDIUM-TIN OXIDE;
ND=YVO4 LASER;
Q-SWITCHED;
SCANNING SPEED;
SODA-LIME GLASS;
INDIUM;
PLASMA DISPLAY DEVICES;
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EID: 55149087015
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.47.7403 Document Type: Article |
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Times cited : (11)
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References (8)
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