Photosensitive high-refractive-index poly(acrylic acid)-graft-poly(ethylene glycol methacrylate) Nanocrystalline Titania hybrid films

Macromolecular Chemistry and Physics

Volumn 209, Issue 17, 2008, Pages 1778-1786

  Su, Hung Wen ^a,b   Chen, Wen Chang ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b AGI Corporation Taiwan   (Taiwan)

Author keywords

Graft copolymers; Hybrid materials; Optical films; Patterning; Titania

Indexed keywords

ABS RESINS; ACIDS; CARBOXYLIC ACIDS; ETHYLENE; ETHYLENE GLYCOL; FILMS; GLYCOLS; GRAFT COPOLYMERS; GRAFTING (CHEMICAL); HIGH RESOLUTION ELECTRON MICROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LIGHT SENSITIVE MATERIALS; MICROSCOPIC EXAMINATION; OPTICAL FILMS; OPTICAL MATERIALS; OPTICAL PROPERTIES; ORGANIC ACIDS; PHOTOSENSITIVITY; POLYACRYLATES; POLYMERS; REFRACTIVE INDEX; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY ANALYSIS; X RAY SCATTERING;

ANATASE STRUCTURES; DOMAIN SIZES; ETHYLENE GLYCOL METHACRYLATE]; FINE PATTERNS; HIGH RESOLUTIONS; HYBRID FILMS; LINE WIDTHS; LITHOGRAPHIC PROCESSES; NANOCRYSTALLINE TITANIA; OPTICALLY TRANSPARENT FILMS; PATTERNING; POLIES (ACRYLIC ACID); TITANIA; TITANIA CONTENTS; X-RAY DIFFRACTIONS;

HYBRID MATERIALS;

EID: 55149083114     PISSN: 10221352     EISSN: 15213935     Source Type: Journal    
DOI: 10.1002/macp.200800174     Document Type: Article

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